Room temperature powder ALD device for all-solid-state battery materials and quantum dot powders.
It is said to be difficult in ALD, but film formation from powder is possible at low temperatures (room temperature to 100°C) and atmospheric pressure!
**Features** - Powder film formation using swirling flow under atmospheric pressure - Control of film thickness according to application - Film formation possible at extremely low temperatures (room temperature to 100°C) **Application Examples** - SiO and Al2O3 film formation on powder for all-solid-state batteries - Film formation on powders such as dielectric materials and magnetic materials - Quantum dot powders **Consultation for Film Formation and Test Coating Available** At Creative Coatings, we accept test coatings and sample creation. We listen to our customers' requests and can suggest suitable equipment, types of films, and film thicknesses. Please feel free to consult with us. ++++++++++++++++++++++++++++++ We provide next-generation vapor phase technology demanded by the times and environment. We contribute to technological innovation with our dual technology of ultra-low temperature high-density plasma ALD equipment for semiconductors and ultra-low temperature high-density plasma powder ALD film formation equipment.
- 企業：Creative Coatings Co., Ltd.
- 価格：Other
